Information for "Publication:1377900"
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Publication:1377900
Basic information
| Display title | A level set approach to a unified model for etching, deposition, and lithography. III: Redeposition, reemission, surface diffusion, and complex simulations |
| Default sort key | 1377900 |
| Page length (in bytes) | 15 |
| Namespace ID | 4206 |
| Namespace | Publication |
| Page ID | 9250290 |
| Page content language | en - English |
| Page content model | wikitext |
| Indexing by robots | Allowed |
| Number of redirects to this page | 0 |
| Counted as a content page | Yes |
| Page views in the past month | 0 |
| MaRDI portal item ID | Q1377900 |
| Central description | scientific article; zbMATH DE number 1110133 |
Page protection
| Edit | Allow only users with "overwriteprofilepages" permission (infinite) |
| Move | Allow only users with "overwriteprofilepages" permission (infinite) |
Edit history
| Page creator | Import240129110113 (talk | contribs) |
| Date of page creation | 15:17, 31 January 2024 |
| Latest editor | Import240129110113 (talk | contribs) |
| Date of latest edit | 15:17, 31 January 2024 |
| Total number of edits | 1 |
| Recent number of edits (within past 90 days) | 0 |
| Recent number of distinct authors | 0 |
