Pages that link to "Item:Q4446788"
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The following pages link to Improving the quality of meshes for the simulation of semiconductor devices using Lepp‐based algorithms (Q4446788):
Displaying 6 items.
- Lepp-bisection algorithms, applications and mathematical properties (Q1030788) (← links)
- There are simple and robust refinements (almost) as good as Delaunay (Q2229908) (← links)
- Mesh quality improvement and other properties in the four-triangles longest-edge partition (Q2388565) (← links)
- Recent progress in robust and quality Delaunay mesh generation (Q2497533) (← links)
- Modified octree mesh generation for Manhattan type structures with narrow layers applied to semiconductor devices (Q3418211) (← links)
- Propagation of longest-edge mesh patterns in local adaptive refinement (Q3515054) (← links)
