A method for coupling free molecular and continuum regime methods in order to simulate chemical vapor deposition (Q2361798)
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| Language | Label | Description | Also known as |
|---|---|---|---|
| English | A method for coupling free molecular and continuum regime methods in order to simulate chemical vapor deposition |
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A method for coupling free molecular and continuum regime methods in order to simulate chemical vapor deposition (English)
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5 July 2017
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chemical vapor deposition
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multi-scale
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fully integrated
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silicon
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