Profile of an unsuccessful process and the criteria for a successful process for the chemical vapor infiltration process (Q2504421)

The author examines a mathematical model of vapor flowing into the porous preform and subsequent interaction which results in the deposition of a solid matrix phase. This process continuously decreases the void, till it vanishes completely. Various parameters involved in the process have been considered. The simplifying assumptions have been made regarding the reaction rate and the ratio of the reaction rate to the diffusion rate to develop the model. The asymptotic and numerical solution of the governing partial differential equations have been presented. The paper makes an interesting reading.