Reactive magnetron sputter deposition of (Ti, Cu)N nano-crystalline thin films: modeling of particle and energy flux toward the substrate (Q2844867)
From MaRDI portal
 | This is the item page for this Wikibase entity, intended for internal use and editing purposes. Please use this page instead for the normal view: Reactive magnetron sputter deposition of (Ti, Cu)N nano-crystalline thin films: modeling of particle and energy flux toward the substrate |
scientific article; zbMATH DE number 6199631
| Language | Label | Description | Also known as |
|---|---|---|---|
| English | Reactive magnetron sputter deposition of (Ti, Cu)N nano-crystalline thin films: modeling of particle and energy flux toward the substrate |
scientific article; zbMATH DE number 6199631 |
Statements
20 August 2013
0 references
0.8324424
0 references
Reactive magnetron sputter deposition of (Ti, Cu)N nano-crystalline thin films: modeling of particle and energy flux toward the substrate (English)
0 references
