Achieving Uniformity in a Semiconductor Fabrication Process Using Spatial Modeling (Q3839575)
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scientific article
| Language | Label | Description | Also known as |
|---|---|---|---|
| English | Achieving Uniformity in a Semiconductor Fabrication Process Using Spatial Modeling |
scientific article |
Statements
15 March 1999
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optimality criteria
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repeatability
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restricted maximum likelihood
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spatial correlation
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variance modeling
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water fabrication
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nonstationary correlation
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Achieving Uniformity in a Semiconductor Fabrication Process Using Spatial Modeling (English)
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