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An Asymptotic Analysis for a Model of Chemical Vapor Deposition on a Microstructured Surface - MaRDI portal

An Asymptotic Analysis for a Model of Chemical Vapor Deposition on a Microstructured Surface (Q4388845)

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scientific article; zbMATH DE number 1150611
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An Asymptotic Analysis for a Model of Chemical Vapor Deposition on a Microstructured Surface
scientific article; zbMATH DE number 1150611

    Statements

    An Asymptotic Analysis for a Model of Chemical Vapor Deposition on a Microstructured Surface (English)
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    10 May 1998
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    time-dependent initial-boundary value problems
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    homogenization
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    singular perturbation
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    heat and mass transfer
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    chemically reacting flows, asymptotic analysis
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    chemical vapor deposition
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    adsorption of gas
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    microstructured surface
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