Simulation of the postexposure bake process of chemically amplified resists by reaction-diffusion equations (Q5953236)
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scientific article; zbMATH DE number 1691260
| Language | Label | Description | Also known as |
|---|---|---|---|
| English | Simulation of the postexposure bake process of chemically amplified resists by reaction-diffusion equations |
scientific article; zbMATH DE number 1691260 |
Statements
Simulation of the postexposure bake process of chemically amplified resists by reaction-diffusion equations (English)
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27 January 2002
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postexposure bake
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chemically amplified resists
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DUV lithography
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reaction-diffusion equations
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polymers
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acids
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alternating direction implicit method
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error-control
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