Optimal control of the wafer temperatures in diffusion/LPCVD reactors

DOI10.1016/0005-1098(92)90112-SzbMath0775.93065MaRDI QIDQ1194861

H. de Waard, Willem L. de Koning

Publication date: 6 October 1992

Published in: Automatica (Search for Journal in Brave)

Mathematics Subject Classification ID

Design techniques (robust design, computer-aided design, etc.) (93B51) Multivariable systems, multidimensional control systems (93C35) Digital control/observation systems (93C62)

Related Items (2)

Numerical algorithms and issues concerning the discrete-time optimal projection equations. ⋮ Optimal control of the wafer temperatures in diffusion/LPCVD reactors

Cites Work

• Stationary optimal control of stochastically sampled continuous-time systems
• Optimal control of the wafer temperatures in diffusion/LPCVD reactors
• Temperature-dependent heat sources or sinks in a stagnation point flow
• Robust static and dynamic output-feedback stabilization: Deterministic and stochastic perspectives
• Robust controller synthesis using the maximum entropy design equations
• Equivalent discrete optimal control problem for randomly sampled digital control systems
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