Optimal control of a chemical vapor deposition reactor

DOI10.1023/A:1022694210246zbMath0908.90182OpenAlexW1623789611WikidataQ116009572 ScholiaQ116009572MaRDI QIDQ1265025

Avner Friedman, Bei Hu

Publication date: 28 February 1999

Published in: Journal of Optimization Theory and Applications (Search for Journal in Brave)

Full work available at URL: https://doi.org/10.1023/a:1022694210246

zbMATH Keywords

optimal controloptimality conditionsbang-bang controlparabolic equationsfree boundary problemshomogenizations

Mathematics Subject Classification ID

Application models in control theory (93C95) Case-oriented studies in operations research (90B90) Existence of optimal solutions belonging to restricted classes (Lipschitz controls, bang-bang controls, etc.) (49J30) Optimality conditions for free problems in one independent variable (49K05)

Related Items (1)

Local analysis of a new multipliers method

Cites Work

• Mathematics in industrial problems. Part 9
• A boundary value problem for the Poisson equation with multi-scale oscillating boundary
• A non-stationary multi-scale oscillating free boundary for the Laplace and heat equations
• Optimal Control for Parabolic Variational Inequalities
• Optimal Control for Variational Inequalities
• An Asymptotic Analysis for a Model of Chemical Vapor Deposition on a Microstructured Surface

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