A two-dimensional model of the chemical vapor deposition of silicon nitride in a low-pressure hot-wall reactor including multicomponent diffusion

DOI10.1016/0017-9310(94)90155-4zbMath0900.76734OpenAlexW2056815987MaRDI QIDQ1388377

D. Massart

Publication date: 15 November 1998

Published in: International Journal of Heat and Mass Transfer (Search for Journal in Brave)

Full work available at URL: https://doi.org/10.1016/0017-9310(94)90155-4

Mathematics Subject Classification ID

Multiphase and multicomponent flows (76T99) Reaction effects in flows (76V05)

Related Items (1)

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Uses Software

• CHEMKIN

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