A mathematical model for wet-chemical diffusion-controlled mask etching through a circular hole

DOI10.1023/A:1022080019181zbMath1024.76060OpenAlexW2121508477MaRDI QIDQ1404099

Hendrik K. Kuiken

Publication date: 20 August 2003

Published in: Journal of Engineering Mathematics (Search for Journal in Brave)

Full work available at URL: https://doi.org/10.1023/a:1022080019181

zbMATH Keywords

asymptotic solutionsoblate spheroidal coordinatesdiffusion-controlled wet-chemical etchingmask opening

Mathematics Subject Classification ID

Diffusion (76R50) Asymptotic methods, singular perturbations applied to problems in fluid mechanics (76M45) Chemically reacting flows (80A32) Reaction effects in flows (76V05)

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