A Monte Carlo model for predicting the effective emissivity of the silicon wafer in rapid thermal processing furnaces

DOI10.1016/S0017-9310(01)00295-2zbMath0991.82500OpenAlexW2012793529MaRDI QIDQ1598342

R. Smith

Publication date: 5 August 2002

Published in: International Journal of Heat and Mass Transfer (Search for Journal in Brave)

Full work available at URL: https://doi.org/10.1016/s0017-9310(01)00295-2

zbMATH Keywords

Monte Carlo methodrapid thermal processingeffective emissivity model

Mathematics Subject Classification ID

Statistical mechanics of semiconductors (82D37)

Related Items (1)

Heat and mass transfer in two-layer elastic composite subjected to thermal infrared radiation

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