Thin-film deposition modeling of hydrogenated amorphous silicon in the afterglow of argon plasma

DOI10.1016/J.COMPFLUID.2013.09.021zbMath1391.76050OpenAlexW2049610146MaRDI QIDQ1643702

Y. Aharonov

Publication date: 19 June 2018

Published in: Computers and Fluids (Search for Journal in Brave)

Full work available at URL: https://doi.org/10.1016/j.compfluid.2013.09.021

zbMATH Keywords

afterglowdeposition rateargon plasma

Mathematics Subject Classification ID

Thin fluid films (76A20)

Cites Work

• Modeling steady axis-symmetric thermal plasma flow of air by a parallelized magneto-hydrodynamic flow solver
• A diagonally dominant second-order accurate implicit scheme

This page was built for publication: Thin-film deposition modeling of hydrogenated amorphous silicon in the afterglow of argon plasma