Arbitrary-pressure chemical vapor deposition modeling using direct simulation Monte Carlo with nonlinear surface chemistry
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Publication:1879617
DOI10.1016/j.jcp.2004.01.018zbMath1068.82524OpenAlexW2060028168MaRDI QIDQ1879617
Husain A. Al-Mohssen, Nicolas G. Hadjiconstantinou
Publication date: 23 September 2004
Published in: Journal of Computational Physics (Search for Journal in Brave)
Full work available at URL: https://doi.org/10.1016/j.jcp.2004.01.018
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Cites Work
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- Fronts propagating with curvature-dependent speed: Algorithms based on Hamilton-Jacobi formulations
- A convergence proof for Bird's direct simulation Monte Carlo method for the Boltzmann equation
- Direct simulation of gas flows at the molecular level
- Time step truncation error in direct simulation Monte Carlo
- Analysis of discretization in the direct simulation Monte Carlo
- DIRECT SIMULATION MONTE CARLO: Recent Advances and Applications
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