Modeling of processes in tunneling lithography

DOI10.1007/BF01125548zbMath0824.35124MaRDI QIDQ1895060

N. I. Khodakovskij, V. P. Derkach, I. V. Medvedev, G. A. Chechko

Publication date: 6 August 1995

Published in: Cybernetics and Systems Analysis (Search for Journal in Brave)

zbMATH Keywords

boundary conditionsaxisymmetric Laplace equationfurther reduction of VLSI components

Mathematics Subject Classification ID

PDEs in connection with optics and electromagnetic theory (35Q60) Motion of charged particles (78A35)

Cites Work

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