An efficient parallel iteration method for multiscale analysis of chemical vapor deposition processes

DOI10.1016/J.APNUM.2011.07.002zbMath1308.76305OpenAlexW2003474549MaRDI QIDQ1946134

N. Cheimarios, Giorgos D. Kokkoris, Andreas G. Boudouvis

Publication date: 18 April 2013

Published in: Applied Numerical Mathematics (Search for Journal in Brave)

Full work available at URL: https://doi.org/10.1016/j.apnum.2011.07.002

zbMATH Keywords

MPIparallel processingmultiscale modelingcomputational fluid dynamics (CFD)chemical vapor deposition (CVD)feature scale modelreactor scale model

Mathematics Subject Classification ID

Thin fluid films (76A20) Reaction effects in flows (76V05)

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