Theoretical analysis of wafer temperature dynamics in a low pressure chemical vapor deposition reactor

DOI10.1016/S0017-9310(99)00069-1zbMath0953.76597OpenAlexW2068177316WikidataQ126635287 ScholiaQ126635287MaRDI QIDQ1972951

Woo-Seung Kim, Il-Kyoung Kim

Publication date: 1 February 2001

Published in: International Journal of Heat and Mass Transfer (Search for Journal in Brave)

Full work available at URL: https://doi.org/10.1016/s0017-9310(99)00069-1

Mathematics Subject Classification ID

Reaction effects in flows (76V05)

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