Optimization of the inlet velocity profile for uniform epitaxial growth in a vertical metalorganic chemical vapor deposition reactor
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Publication:1972952
DOI10.1016/S0017-9310(99)00085-XzbMath0977.76093OpenAlexW2062191400MaRDI QIDQ1972952
Publication date: 20 February 2001
Published in: International Journal of Heat and Mass Transfer (Search for Journal in Brave)
Full work available at URL: https://doi.org/10.1016/s0017-9310(99)00085-x
optimization procedureinlet velocity profile6th-degree Chebyshev polynomialuniform epitaxial growthvertical metalorganic chemical vapor deposition reactor
Variational methods applied to problems in fluid mechanics (76M30) Reaction effects in flows (76V05)
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