Selection of measurement locations for the control of rapid thermal processor
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Publication:1974003
DOI10.1016/S0005-1098(99)00197-1zbMath0945.93591OpenAlexW2065056107MaRDI QIDQ1974003
Cheng-Ching Yu, Chi-Jay Huang, Shih-Haur Shen
Publication date: 10 October 2000
Published in: Automatica (Search for Journal in Brave)
Full work available at URL: https://doi.org/10.1016/s0005-1098(99)00197-1
Related Items (2)
Thermal budget control for processes with spike-shaped temperature profiles: Application to rapid thermal annealing ⋮ Transient inverse design of radiative enclosures for thermal processing of materials
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