Understanding the contribution of energy and angular distribution in the morphology of thin films using Monte Carlo simulation

DOI10.1515/MCMA-2018-0019zbMath1497.82019OpenAlexW2884783462WikidataQ129460949 ScholiaQ129460949MaRDI QIDQ1990062

Abdelkader Bouazza, Abderrahmane Settaouti

Publication date: 24 October 2018

Published in: Monte Carlo Methods and Applications (Search for Journal in Brave)

Full work available at URL: https://doi.org/10.1515/mcma-2018-0019

zbMATH Keywords

Monte Carlo simulationthin filmssputtering yieldsputtering

Mathematics Subject Classification ID

Monte Carlo methods (65C05) Statistical mechanics of metals (82D35) Statistical mechanics of plasmas (82D10)

Related Items (1)

3D sputtering simulations of the CZTS, Si and CIGS thin films using Monte-Carlo method

Uses Software

• SRIM

Cites Work

• Study and simulation of the sputtering process of material layers in plasma

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