A method for coupling free molecular and continuum regime methods in order to simulate chemical vapor deposition

DOI10.1016/J.COMPFLUID.2012.02.010zbMath1365.76281OpenAlexW2035139772MaRDI QIDQ2361798

Jonathan Jilesen, Fue-Sang Lien

Publication date: 5 July 2017

Published in: Computers and Fluids (Search for Journal in Brave)

Full work available at URL: https://doi.org/10.1016/j.compfluid.2012.02.010

zbMATH Keywords

siliconchemical vapor depositionmulti-scalefully integrated

Mathematics Subject Classification ID

Navier-Stokes equations for incompressible viscous fluids (76D05) Finite volume methods applied to problems in fluid mechanics (76M12) Rarefied gas flows, Boltzmann equation in fluid mechanics (76P05) Reaction effects in flows (76V05)

Cites Work

• A stable and accurate convective modelling procedure based on quadratic upstream interpolation
• A calculation procedure for heat, mass and momentum transfer in three- dimensional parabolic flows
• Numerical study of the turbulent flow past an airfoil with trailing edge separation
• Direct simulation of gas flows at the molecular level

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