A new class of two-level optimal extended designs
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Publication:287389
DOI10.1016/j.jkss.2015.09.003zbMath1338.62174OpenAlexW2195889309MaRDI QIDQ287389
Kashinath Chatterjee, Tingxun Gou, Hong Qin
Publication date: 26 May 2016
Published in: Journal of the Korean Statistical Society (Search for Journal in Brave)
Full work available at URL: https://doi.org/10.1016/j.jkss.2015.09.003
Related Items (11)
Level-augmented uniform designs ⋮ Lee discrepancy on mixed two- and three-level uniform augmented designs ⋮ Uniform row augmented designs with multi-level ⋮ Maximin \(L_1\)-distance range-fixed level-augmented designs ⋮ Lower bounds of the average mixture discrepancy for row augmented designs with mixed four- and five-level ⋮ A lower bound of average mixture discrepancy for row augmented designs ⋮ Sequentially weighted uniform designs ⋮ Uniform augmented \(q\)-level designs ⋮ A study of uniformity pattern for extended designs ⋮ Efficient asymmetrical extended designs under wrap-around \(L_2\)-discrepancy ⋮ Augmented uniform designs
Cites Work
- Addition of runs to an \(s\)-level supersaturated design
- Some new lower bounds to centered and wrap-round \(L_2\)-discrepancies
- Batch sequential designs for computer experiments
- Uniform Design: Theory and Application
- Miscellanea. A connection between uniformity and aberration in regular fractions of two-level factorials
- Sequential Design for Microarray Experiments
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