A Robust Computational Algorithm for Inverse Photomask Synthesis in Optical Projection Lithography

DOI10.1137/110830356zbMath1250.65081OpenAlexW1973654887MaRDI QIDQ2912286

Edmund Y. Lam, Man-Lai Tang, Ningning Jia, Chong Sze Tong, Siu Kai Choy

Publication date: 14 September 2012

Published in: SIAM Journal on Imaging Sciences (Search for Journal in Brave)

Full work available at URL: http://hdl.handle.net/10722/152663

zbMATH Keywords

algorithmtotal variationregularizationimage synthesisChambolle's fast duality projection algorithminverse lithography

Mathematics Subject Classification ID

Numerical methods involving duality (49M29) Numerical optimization and variational techniques (65K10) Existence theories for optimal control problems involving partial differential equations (49J20)

Related Items (2)

A Variational Approach to the Inverse Photolithography Problem ⋮ An Alternating Direction Method of Multipliers for Inverse Lithography Problem

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