A Model for Extreme Ultraviolet Radiation Conversion Efficiency From Laser Produced Mass-Limited Tin-Based Droplet Target Plasmas

DOI10.1088/0253-6102/57/4/25zbMath1247.76094OpenAlexW1605536683MaRDI QIDQ2913662

Xinbing Wang, Lun Xiong, Shi-Cheng Yu, Tao Wu

Publication date: 26 September 2012

Published in: Communications in Theoretical Physics (Search for Journal in Brave)

Full work available at URL: https://doi.org/10.1088/0253-6102/57/4/25

zbMATH Keywords

conversion efficiencyextreme ultraviolet lithographylaser produced plasma

Mathematics Subject Classification ID

Quantum optics (81V80) Lasers, masers, optical bistability, nonlinear optics (78A60) Ionized gas flow in electromagnetic fields; plasmic flow (76X05)

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