Modeling of mask diffraction and projection imaging for advanced optical and EUV lithography

DOI10.1080/09500340.2010.515752zbMath1218.78035OpenAlexW1966400057MaRDI QIDQ3019693

A. Erdmann, Peter Evanschitzky, Feng Shao, Viviana Agudelo, Tim Fühner

Publication date: 28 July 2011

Published in: Journal of Modern Optics (Search for Journal in Brave)

Full work available at URL: https://doi.org/10.1080/09500340.2010.515752

zbMATH Keywords

image modelinglithography simulationmask topographyrigorous diffraction modeling

Mathematics Subject Classification ID

Diffraction, scattering (78A45) Finite difference methods applied to problems in optics and electromagnetic theory (78M20)

Cites Work

• Numerical solution of initial boundary value problems involving maxwell's equations in isotropic media
• On the diffraction theory of optical images

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