INFLUENCE OF POROSITY OF MATERIALS ON REDISTRIBUTION OF DOPANT DURING MANUFACTURING OF DIFFUSION-JUNCTION RECTIFIERS IN SEMICONDUCTOR HETEROSTRUCTURES

DOI10.1142/S021798491002536XzbMath1208.82072MaRDI QIDQ3070415

E. L. Pankratov

Publication date: 3 February 2011

Published in: Modern Physics Letters B (Search for Journal in Brave)

zbMATH Keywords

diffusion in porous materialincreasing sharpness of \(p-n\) junctionsmodification of porosityoptimization of annealing

Mathematics Subject Classification ID

Statistical mechanics of semiconductors (82D37)

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