Implementing virtual metrology for in-line quality control in semiconductor manufacturing

DOI10.1080/00207720802645204zbMath1171.90383OpenAlexW2054281524MaRDI QIDQ3183733

Damon He Tai, Jason Chao-Hsien Pan

Publication date: 21 October 2009

Published in: International Journal of Systems Science (Search for Journal in Brave)

Full work available at URL: https://doi.org/10.1080/00207720802645204

zbMATH Keywords

quality controlsemiconductor manufacturingvirtual metrologySPC

Mathematics Subject Classification ID

Reliability, availability, maintenance, inspection in operations research (90B25) Production models (90B30) Application models in control theory (93C95)

Uses Software

• LISREL
• PRELIS

Cites Work

• Decision rule of assignable causes removal under an SPC-EPC integration system
• Simulated annealing procedure for on-line control with process dynamics
• An algorithm for the properties of the integrated process control with bounded adjustments and EWMA monitoring

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