AN EFFICIENT DIFFUSION ALGORITHM FOR 2‐D VLSI PROCESS MODELING CODE

DOI10.1108/EB010078zbMath0727.65109OpenAlexW2066223947MaRDI QIDQ3349929

A. M. Asenov, E. N. Stefanov

Publication date: 1990

Published in: COMPEL - The international journal for computation and mathematics in electrical and electronic engineering (Search for Journal in Brave)

Full work available at URL: https://doi.org/10.1108/eb010078

zbMATH Keywords

numerical experimentsdiffusion equationfinite difference methodssemiconductor processing2-D VLSI processcurved moving boundarieslocally-one dimensional algorithmnonlinear two-dimensional problem

Mathematics Subject Classification ID

Nonlinear parabolic equations (35K55) Free boundary problems for PDEs (35R35) Finite difference methods for boundary value problems involving PDEs (65N06) Applications to the sciences (65Z05)

Cites Work

• TWO‐DIMENSIONAL PROCESS SIMULATION USING A QUADRATIC FINITE ELEMENT DISCRETIZATION
• Two-Dimensional Concentration Dependent Diffusion

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