Multi-step virtual metrology for semiconductor manufacturing: a multilevel and regularization methods-based approach

DOI10.1016/J.COR.2014.05.008zbMATH Open1348.90456OpenAlexW2507812949MaRDI QIDQ337315

Gian Antonio Susto, Alessandro Beghi, Andrea Schirru, Simone Pampuri, G. De Nicolao

Publication date: 10 November 2016

Published in: Computers \& Operations Research (Search for Journal in Brave)

Full work available at URL: https://doi.org/10.1016/j.cor.2014.05.008

zbMATH Keywords

ridge regressionregularization methodschemical vapor depositionsemiconductor manufacturinglassostatistical modelingetchingindustry automationlithographyvirtual metrology

Mathematics Subject Classification ID

Production models (90B30) Case-oriented studies in operations research (90B90)

Cites Work

• Unnamed Item
• Generalized additive models
• Least angle regression. (With discussion)
• Cross-Validation of Regression Models
• Linear Model Selection by Cross-Validation
• Regularization and Variable Selection Via the Elastic Net
• Ridge Regression: Biased Estimation for Nonorthogonal Problems

Related Items (1)

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