Modified octree mesh generation for Manhattan type structures with narrow layers applied to semiconductor devices
From MaRDI portal
Publication:3418211
DOI10.1002/JNM.623zbMath1104.82050OpenAlexW2075518905MaRDI QIDQ3418211
J. J. Pombo, A. J. García-Loureiro, Manuel Aldegunde
Publication date: 2 February 2007
Published in: International Journal of Numerical Modelling: Electronic Networks, Devices and Fields (Search for Journal in Brave)
Full work available at URL: https://doi.org/10.1002/jnm.623
Statistical mechanics of semiconductors (82D37) Mesh generation, refinement, and adaptive methods for boundary value problems involving PDEs (65N50)
Related Items (2)
Development of a 3D Parallel Finite Element Monte Carlo Simulator for Nano-MOSFETs ⋮ Optimization of linear systems for 3D parallel simulation of semiconductor devices: Application to statistical studies
Uses Software
This page was built for publication: Modified octree mesh generation for Manhattan type structures with narrow layers applied to semiconductor devices