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Implementation of sub-Rayleigh-resolution lithography using anN-photon absorber - MaRDI portal

Implementation of sub-Rayleigh-resolution lithography using anN-photon absorber

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Publication:3429397

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DOI10.1080/09500340600895656zbMath1121.78359OpenAlexW2066546597MaRDI QIDQ3429397

Malcolm N. O'Sullivan-Hale, Heedeuk Shin, Hye Jeong Chang, Robert W. Boyd

Publication date: 30 March 2007

Published in: Journal of Modern Optics (Search for Journal in Brave)

Full work available at URL: https://doi.org/10.1080/09500340600895656

zbMATH Keywords

quantum lithography Rayleigh limit multi-photon absorbing material

Mathematics Subject Classification ID

Technical applications of optics and electromagnetic theory (78A55) Lasers, masers, optical bistability, nonlinear optics (78A60)

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