Achieving Uniformity in a Semiconductor Fabrication Process Using Spatial Modeling

DOI10.2307/2669600zbMath0908.62104OpenAlexW4252921587MaRDI QIDQ3839575

Jye-Chyi Lu, Ronald S. Gyurcsik, Jacqueline M. Hughes-Oliver, Joseph C. Davis

Publication date: 15 March 1999

Full work available at URL: http://www.lib.ncsu.edu/resolver/1840.4/8510

zbMATH Keywords

optimality criteriarestricted maximum likelihoodspatial correlationrepeatabilityvariance modelingnonstationary correlationwater fabrication

Mathematics Subject Classification ID

Applications of statistics in engineering and industry; control charts (62P30) Survival analysis and censored data (62N99)

Related Items (3)

Performance of information criteria for spatial models ⋮ Parametric covariance models for shock-induced stochastic processes ⋮ Parametric nonstationary correlation models

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