Partly dissipative reaction-diffusion systems and a model of phosphorus diffusion in silicon
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Publication:4032228
DOI10.1016/0362-546X(92)90083-QzbMath0773.35029MaRDI QIDQ4032228
Selwyn L. Hollis, Jeffrey J. Morgan
Publication date: 1 April 1993
Published in: Nonlinear Analysis: Theory, Methods & Applications (Search for Journal in Brave)
Related Items (6)
Invariant regions and existence of global solutions to a generalized m-component reaction-diffusion system with tridiagonal symmetric Toeplitz diffusion matrix ⋮ Asymptotic behaviour of the solution to a singularly perturbed partially dissipative system with a multiple root of the degenerate equation ⋮ Discrete-time methods for equations modelling transport of foreign-atoms in semiconductors ⋮ Singularly perturbed partially dissipative systems of equations ⋮ Asymptotic behaviour of a boundary layer solution to a stationary partly dissipative system with a multiple root of the degenerate equation ⋮ Singularly perturbed partly dissipative reaction-diffusion systems in case of exchange of stabilities.
Cites Work
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- Global solutions of reaction-diffusion systems
- Finite time blowup for semilinear reactive-diffusive systems
- Global Existence for Semilinear Parabolic Systems
- Boundedness and Decay Results for Reaction-Diffusion Systems
- Global Existence and Boundedness in Reaction-Diffusion Systems
- Finite-Dimensional Attractors Associated with Partly Dissipative Reaction-Diffusion Systems
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