An Asymptotic Analysis for a Model of Chemical Vapor Deposition on a Microstructured Surface

DOI10.1137/S0036139999528467zbMath0926.65084OpenAlexW2001500862MaRDI QIDQ4388845

Christian Ringhofer, Matthias K. Gobbert

Publication date: 10 May 1998

Published in: SIAM Journal on Applied Mathematics (Search for Journal in Brave)

Full work available at URL: https://doi.org/10.1137/s0036139999528467

zbMATH Keywords

singular perturbationhomogenizationchemical vapor depositionheat and mass transfermicrostructured surfacetime-dependent initial-boundary value problemsadsorption of gaschemically reacting flows, asymptotic analysis

Mathematics Subject Classification ID

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