The dissociative diffusion mechanism with charge effects II: Two-dimensional in-diffusion

DOI10.1093/QJMAM/57.1.19zbMath1073.82042OpenAlexW4240956677MaRDI QIDQ4650655

Martin Meere, John R. King

Publication date: 18 February 2005

Published in: The Quarterly Journal of Mechanics and Applied Mathematics (Search for Journal in Brave)

Full work available at URL: https://doi.org/10.1093/qjmam/57.1.19

zbMATH Keywords

semiconductorsimpurity diffusionmask technology

Mathematics Subject Classification ID

Statistical mechanics of semiconductors (82D37)

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