Dépôt électrolytique épais: Modification du profil de la pièce à revêtir

DOI10.1080/12506559.1999.10511387zbMath0962.78004OpenAlexW2531142566MaRDI QIDQ4954020

P. Paumelle, Pierre Villon, Frédéric Druesne

Publication date: 19 June 2001

Published in: Revue Européenne des Éléments Finis (Search for Journal in Brave)

Full work available at URL: https://doi.org/10.1080/12506559.1999.10511387

zbMATH Keywords

boundary element methoddepositing thicknesselectrode growthelectromechanical platingpolarisation laws

Mathematics Subject Classification ID

Boundary element methods applied to problems in optics and electromagnetic theory (78M15) Electromagnetic theory (general) (78A25)

Related Items (1)

Application of the BEM to chromium electroplating simulation and to identification of experimental polarisation laws.

This page was built for publication: Dépôt électrolytique épais: Modification du profil de la pièce à revêtir