A study of uniformity pattern for extended designs

DOI10.1080/03610926.2017.1343843OpenAlexW2734190953MaRDI QIDQ5160220

Kashinath Chatterjee, Hong Qin, Tingxun Gou

Publication date: 28 October 2021

Published in: Communications in Statistics - Theory and Methods (Search for Journal in Brave)

Full work available at URL: https://doi.org/10.1080/03610926.2017.1343843

zbMATH Keywords

lower boundprojection discrepancycentered \(L_2\)-discrepancytwo-level uniform design

Mathematics Subject Classification ID

Factorial statistical designs (62K15)

Related Items

Projection uniformity under mixture discrepancy

Cites Work

• A new class of two-level optimal extended designs
• Uniformity pattern and related criteria for \(q\)-level factorials
• Some new lower bounds to centered and wrap-round \(L_2\)-discrepancies
• Application of minimum projection uniformity criterion in complementary designs
• On the optimality of orthogonal array plus one run plans
• A note on uniformity and orthogonality
• Batch sequential designs for computer experiments
• Multiplier ideal sheaves in complex and algebraic geometry
• Minimum projection uniformity criterion and its application
• A generalized discrepancy and quadrature error bound
• Uniform designs limit aliasing
• Uniform Design: Theory and Application
• Uniform sliced Latin hypercube designs
• Miscellanea. A connection between uniformity and aberration in regular fractions of two-level factorials
• Optimal Additions to and Deletions from Two-Level Orthogonal Arrays
• Sequential Design for Microarray Experiments
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