Gradient-Based Source and Mask Optimization in Optical Lithography
From MaRDI portal
Publication:5370244
DOI10.1109/TIP.2011.2131668zbMath1372.94207OpenAlexW1991610979WikidataQ51586252 ScholiaQ51586252MaRDI QIDQ5370244
Yao Peng, Yan Wang, Zhiping Yu, Jinyu Zhang
Publication date: 19 October 2017
Published in: IEEE Transactions on Image Processing (Search for Journal in Brave)
Full work available at URL: https://doi.org/10.1109/tip.2011.2131668
Image processing (compression, reconstruction, etc.) in information and communication theory (94A08) Source coding (94A29) Geometric optics (78A05)
Related Items (1)
This page was built for publication: Gradient-Based Source and Mask Optimization in Optical Lithography