Modeling and simulation of a chemical vapor deposition

DOI10.1155/2011/641920zbMath1381.80008OpenAlexW1966827983WikidataQ58690478 ScholiaQ58690478MaRDI QIDQ539001

Yong-Cai Geng, Sumit K. Garg

Publication date: 27 May 2011

Published in: Journal of Applied Mathematics (Search for Journal in Brave)

Full work available at URL: https://doi.org/10.1155/2011/641920

Mathematics Subject Classification ID

Classical flows, reactions, etc. in chemistry (92E20) Chemically reacting flows (80A32)

Related Items (1)

Adaptive step-size control in simulation of diffusive CVD processes

Uses Software

• UG
• r3t

Cites Work

• Discretization methods with embedded analytical solutions for convection-diffusion dispersion-reaction equations and applications
• Flux-based method of characteristics for contaminant transport in flowing groundwater
• Solving Ordinary Differential Equations I
• An Asymptotic Analysis for a Model of Chemical Vapor Deposition on a Microstructured Surface
• Decomposition Methods for Differential Equations
• UG -- a flexible software toolbox for solving partial differential equations
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