Automatic identification of spatial defect patterns for semiconductor manufacturing
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Publication:5444442
DOI10.1080/02772240600610822zbMath1128.90465OpenAlexW2005407075MaRDI QIDQ5444442
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Publication date: 25 February 2008
Published in: International Journal of Production Research (Search for Journal in Brave)
Full work available at URL: https://doi.org/10.1080/02772240600610822
Cites Work
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- Monitoring Wafer Map Data from Integrated Circuit Fabrication Processes for Spatially Clustered Defects
- Regularized Gaussian Discriminant Analysis Through Eigenvalue Decomposition
- Wafer bin map recognition using a neural network approach
- Detecting Spatial Effects from Factorial Experiments: An Application from Integrated-Circuit Manufacturing
- On clustering validation techniques
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