An Alternating Direction Method of Multipliers for Inverse Lithography Problem

DOI10.4208/nmtma.oa-2022-0151arXiv2209.10814MaRDI QIDQ6191763

Haibo Liu, Junqing Chen

Publication date: 11 March 2024

Published in: Numerical Mathematics: Theory, Methods and Applications (Search for Journal in Brave)

Full work available at URL: https://arxiv.org/abs/2209.10814

zbMATH Keywords

total variation regularizationADMM frameworkinverse lithography techniques

Mathematics Subject Classification ID

Inverse problems (including inverse scattering) in optics and electromagnetic theory (78A46) Optimization problems in optics and electromagnetic theory (78M50)

Cites Work

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• A splitting method for orthogonality constrained problems
• Lectures on convex optimization
• A dual algorithm for the solution of nonlinear variational problems via finite element approximation
• An algorithm for total variation minimization and applications
• Global convergence of ADMM in nonconvex nonsmooth optimization
• A Robust Computational Algorithm for Inverse Photomask Synthesis in Optical Projection Lithography
• Alternating direction methods for classical and ptychographic phase retrieval
• The Split Bregman Method for L1-Regularized Problems
• An Augmented Lagrangian Method for Identifying Discontinuous Parameters in Elliptic Systems
• A Nonlinear Primal-Dual Method for Total Variation-Based Image Restoration
• Edge-preserving and scale-dependent properties of total variation regularization
• Gradient-Based Source and Mask Optimization in Optical Lithography
• An Iterative Regularization Method for Total Variation-Based Image Restoration
• Image Processing and Analysis

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