Implementation and evaluation of the level set method: towards efficient and accurate simulation of wet etching for microengineering applications
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Publication:6556352
DOI10.1016/j.cpc.2013.05.016MaRDI QIDQ6556352
J. Cerdá, M. A. Gosálvez, C. Montoliu, R. J. Colom, Néstor Ferrando
Publication date: 17 June 2024
Published in: Computer Physics Communications (Search for Journal in Brave)
cellular automataparallel computinglevel set methodMEMSGPUsparse field methodanisotropic wet chemical etchingmicroengineering
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