A multi-phase-field model of void crossing grain boundary under electromigration-induced anisotropic surface diffusion in interconnects
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Publication:6558121
DOI10.1016/j.euromechsol.2024.105305MaRDI QIDQ6558121
Publication date: 18 June 2024
Published in: European Journal of Mechanics. A. Solids (Search for Journal in Brave)
finite element methodcrystal orientationelectromigrationmulti-phase-field modelanisotropic surface diffusionmisorientation difference
Cites Work
- Irreversible thermodynamics of triple junctions during the intergranular void motion under the electromigration forces
- A phase field model for the electromigration of intergranular voids
- The Cahn–Hilliard equation with a concentration dependent mobility: motion by minus the Laplacian of the mean curvature
- Free Energy of a Nonuniform System. I. Interfacial Free Energy
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