Topology optimization for optical microlithography with partially coherent illumination
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Publication:6565207
DOI10.1002/nme.5299zbMATH Open1548.74635MaRDI QIDQ6565207
M. D. Zhou, Ole Sigmund, Boyan Stefanov Lazarov
Publication date: 1 July 2024
Published in: International Journal for Numerical Methods in Engineering (Search for Journal in Brave)
topology optimizationMEMSoptical microlithographypartially coherent illuminationrobust source and mask optimization
Cites Work
- Volume preserving nonlinear density filter based on Heaviside functions
- On projection methods, convergence and robust formulations in topology optimization
- Topology optimization considering material and geometric uncertainties using stochastic collocation methods
- Generating optimal topologies in structural design using a homogenization method
- Minimum length scale in topology optimization by geometric constraints
- Filters in topology optimization
- Topology synthesis of large-displacement compliant mechanisms
- A Robust Computational Algorithm for Inverse Photomask Synthesis in Optical Projection Lithography
- The method of moving asymptotes—a new method for structural optimization
- Achieving minimum length scale in topology optimization using nodal design variables and projection functions
- Gradient-Based Source and Mask Optimization in Optical Lithography
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