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Features of the formation of silicon nanocrystals upon the annealing of SiO\(_2\) layers implanted with Si ions - MaRDI portal

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Features of the formation of silicon nanocrystals upon the annealing of SiO\(_2\) layers implanted with Si ions

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Publication:693973

DOI10.3103/S106287381105039XzbMATH Open1253.82138OpenAlexW2118638629MaRDI QIDQ693973

Author name not available (Why is that?)

Publication date: 11 December 2012

Published in: (Search for Journal in Brave)

Full work available at URL: https://doi.org/10.3103/s106287381105039x




Mathematics Subject Classification ID

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