Thickness effect of a thin film on the stress field due to the eigenstrain of an ellipsoidal inclusion

DOI10.1016/j.ijsolstr.2008.08.039zbMath1168.74395OpenAlexW2054308952MaRDI QIDQ834421

Biao Wang, Xinghua Liang, Yu-Lan Liu

Publication date: 26 August 2009

Published in: International Journal of Solids and Structures (Search for Journal in Brave)

Full work available at URL: https://doi.org/10.1016/j.ijsolstr.2008.08.039

zbMATH Keywords

thicknessellipsoidal inclusionthin filmstress fieldhalf-spaceeigenstrain

Mathematics Subject Classification ID

Inhomogeneity in solid mechanics (74E05) Thin films (74K35)

Related Items (2)

A general perturbation method for inhomogeneities in anisotropic and piezoelectric solids with applications to quantum-dot nanostructures ⋮ Thickness effects in polycrystalline thin films: surface constraint versus interior constraint

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• A General Solution for Two-Dimensional Stress Distributions in Thin Films
• On the Stress Field Due to Initial Strains in a Cuboid Surrounded by an Infinite Elastic Space

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