Generalized thermo-elastodynamics for semiconductor material subject to ultrafast laser heating. I: Model description and validation

DOI10.1016/j.ijheatmasstransfer.2009.10.010zbMath1180.82160OpenAlexW2028507671MaRDI QIDQ846657

Xuele Qi, Steve C. S. Suh

Publication date: 9 February 2010

Published in: International Journal of Heat and Mass Transfer (Search for Journal in Brave)

Full work available at URL: https://doi.org/10.1016/j.ijheatmasstransfer.2009.10.010

zbMATH Keywords

generalized thermoelasticityaxisymmetric modelsilicon waferstaggered finite differenceultrafast laser pulse

Mathematics Subject Classification ID

Thermodynamics in solid mechanics (74A15) Rarefied gas flows, Boltzmann equation in fluid mechanics (76P05) Statistical mechanics of semiconductors (82D37) Transport processes in time-dependent statistical mechanics (82C70) Lasers, masers, optical bistability, nonlinear optics (78A60) Motion of charged particles (78A35)

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