A lamp thermoelectricity based integrated bake/chill system for photoresist processing

DOI10.1016/J.IJHEATMASSTRANSFER.2006.07.016zbMath1107.80306OpenAlexW1993229294MaRDI QIDQ865848

Arthur Tay, Xiao Dong Wu, Hui Tong Chua

Publication date: 20 February 2007

Published in: International Journal of Heat and Mass Transfer (Search for Journal in Brave)

Full work available at URL: https://doi.org/10.1016/j.ijheatmasstransfer.2006.07.016

zbMATH Keywords

temperature controlthermoelectricitymicrolithographylamp heatingphotoresist processing

Mathematics Subject Classification ID

Transport processes in time-dependent statistical mechanics (82C70) Waves and radiation in optics and electromagnetic theory (78A40)

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