Multiple-input dual-output adjustment scheme for semiconductor manufacturing processes using a dynamic dual-response approach

DOI10.1016/j.ejor.2006.05.003zbMath1123.90013OpenAlexW2127834522MaRDI QIDQ869631

N. E. Zubov

Publication date: 8 March 2007

Published in: European Journal of Operational Research (Search for Journal in Brave)

Full work available at URL: https://doi.org/10.1016/j.ejor.2006.05.003

zbMATH Keywords

semiconductor manufacturingdual-response optimizationon-line quality controlprocess adjustmentrun-to-run feedback control

Mathematics Subject Classification ID

Production models (90B30)

Related Items (1)

An adaptive exponentially weighted moving average-type control chart to monitor the process mean

Cites Work

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• Optimization of dual response systems: A comprehensive procedure for degenerate and nondegenerate problems
• Problems of identification and control
• General run-to-run (R2R) control framework using self-tuning control for multiple-input multiple-output (MIMO) processes
• Convergence of a multi-input adaptive extremum controller
• "Ridge Analysis" of Response Surfaces
• Response Surface Techniques for Dual Response Systems
• Automatic control in microelectronics manufacturing: Practices, challenges, and possibilities.

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